Abstract
An exact algebraic expression is derived for the diffusivity for diffusion between interstitial e and g sites in cubic C15 Laves phase AB₂ in terms of four jump rates between interstitial sites. The result is for the low concentration limit of diffusing atoms and is valid for arbitrary positions of the e and g sites. The expression reduces to simple forms in some special cases. Some examples of diffusion of H in C15 intermetallic compounds are discussed.
| Original language | English |
|---|---|
| Pages (from-to) | 1329-1334 |
| Journal | Journal of Physics: Condensed Matter |
| Volume | 17 |
| Issue number | 8 |
| DOIs | |
| Publication status | Published - 2005 |
Keywords
- Surfaces and Structural Properties of Condensed Matter
Fingerprint
Dive into the research topics of 'Diffusivity for diffusion between e and g interstitial sites in the C15 AB₂ structure'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver